A two-step plasma enhanced chemical vapor deposition procedure has been developed to produce high quality Si x N y H z films for quantum cascade laser applications. The procedure consists in exposing the GaAs substrate to a controlled N 2 plasma previous to the silicon nitride film deposition. The p
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The properties of copper films deposited on polyimide by nitrogen and oxygen plasma pre-treatment
β Scribed by Chih-hao Yang; Shih-chin Lee; Jun-ming Wu; Tien-chai Lin
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 303 KB
- Volume
- 252
- Category
- Article
- ISSN
- 0169-4332
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