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Silicon Carbonitride Films Produced by Remote Hydrogen Microwave Plasma CVD Using a (Dimethylamino)dimethylsilane Precursor

✍ Scribed by I. Blaszczyk-Lezak; A. M. Wrobel; M. P. M. Kivitorma; I. J. Vayrynen

Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
540 KB
Volume
11
Category
Article
ISSN
0948-1907

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