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Silicon Carbonitride (SiCN) Films by Remote Hydrogen Microwave Plasma CVD from Tris(dimethylamino)silane as Novel Single-Source Precursor

✍ Scribed by Aleksander M. Wrobel; Iwona Blaszczyk-Lezak; Pawel Uznanski; Bartosz Glebocki

Publisher: John Wiley and Sons
Year: 2010
Tongue: English
Weight: 294 KB
Volume: 16
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.201004287

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