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Si(100)âSiO[sub 2] interface properties following rapid thermal processing

✍ Scribed by OâSullivan, B. J.; Hurley, P. K.; Leveugle, C.; Das, J. H.

Book ID: 119949544
Publisher: American Institute of Physics
Year: 2001
Tongue: English
Weight: 383 KB
Volume: 89
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1343897

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