Examination of the Si(111)-SiO[sub 2], Si(110)-SiO[sub 2], and Si(100)-SiO[sub 2] Interfacial Properties Following Rapid Thermal Annealing

✍ Scribed by Hurley, P. K.; O’Sullivan, B. J.; Cubaynes, F. N.; Stolk, P. A.; Widdershoven, F. P.; Das, J. H.

• Book ID: 119949075
• Publisher: The Electrochemical Society
• Year: 2002
• Tongue: English
• Weight: 102 KB
• Volume: 149
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.1447946