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Si nanocrystals by ultra-low energy ion implantation for non-volatile memory applications

✍ Scribed by H. Coffin; C. Bonafos; S. Schamm; M. Carrada; N. Cherkashin; G. Ben Assayag; P. Dimitrakis; P. Normand; M. Respaud; A. Claverie

No coin nor oath required. For personal study only.

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Nanocrystals manufacturing by ultra-low-

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Fabrication of nanocrystal memories by u

✍ N. Cherkashin; C. Bonafos; H. Coffin; M. Carrada; S. Schamm; G. Ben Assayag; D. 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 267 KB

Processing issues in silicon nanocrystal

✍ P. Normand; P. Dimitrakis; E. Kapetanakis; D. Skarlatos; K. Beltsios; D. Tsoukal 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 281 KB

Ultra-low-energy ion-beam-synthesis of G

✍ P. Dimitrakis; A. Mouti; C. Bonafos; S. Schamm; G. Ben Assayag; V. Ioannou-Sougl 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 587 KB

Ion irradiation through SiO2/Si interfac

✍ B. Schmidt; K.-H. Heinig; L. Röntzsch; T. Müller; K.-H. Stegemann; E. Votintseva 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 144 KB

Implantation energy effect on photolumin

✍ R. Diaz; C. Suarez; A. Arbouet; R. Marty; V. Paillard; F. Gloux; C. Bonafos; S. 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 517 KB