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Implantation energy effect on photoluminescence spectroscopy of Si nanocrystals locally fabricated by stencil-masked ultra-low-energy ion-beam-synthesis in silica

✍ Scribed by R. Diaz; C. Suarez; A. Arbouet; R. Marty; V. Paillard; F. Gloux; C. Bonafos; S. Schamm-Chardon; J. Grisolia; P. Normand; P. Dimitrakis; G. BenAssayag

Book ID: 113823314
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 517 KB
Volume: 272
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2011.01.031

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## Abstract We propose an original approach called “stencil‐masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO~2~ layer. This process consists in implanting silicon ions at ultra‐low energy through a stencil ma