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Selflimiting adsorption of precursors for chemical vapor deposition of oxide superconductors

✍ Scribed by S. Oda; H. Zama; K. Masuda; K. Fujii; Y.C. Chen

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
166 KB
Volume
185-189
Category
Article
ISSN
0921-4534

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Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 Β°C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W