Chemical vapor deposition of tungsten oxide

✍ Scribed by Rein U. Kirss; Lamartine Meda

• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 117 KB
• Volume: 12
• Category: Article
• ISSN: 0268-2605
• DOI: 10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-z

✦ Synopsis

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W(OEt) x , x = 5, 6] and tetra(allyl)tungsten [W(h 3 -C 3 H 5 ) 4 ] are summarized. The electrochromic behavior of these films is comparable with that observed for WO 3 films prepared by evaporation, sputtering and electrodeposition.