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Kinetic investigation of chemical vapor deposition of B4C on tungsten substrate

✍ Scribed by Mustafa Karaman; N. Aslı Sezgi; Timur Doğu; H. Önder Özbelge


Publisher
American Institute of Chemical Engineers
Year
2006
Tongue
English
Weight
135 KB
Volume
52
Category
Article
ISSN
0001-1541

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Chemical vapor deposition of tungsten ox
✍ Rein U. Kirss; Lamartine Meda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 117 KB 👁 1 views

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W