Chemical vapor deposition of tungsten ox
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Rein U. Kirss; Lamartine Meda
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Article
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1998
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John Wiley and Sons
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English
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Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 Β°C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W