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Selective growth of tensily strained Si1−yCy films on patterned Si substrates

✍ Scribed by A. Gouyé; F. Hüe; A. Halimaoui; O. Kermarrec; Y. Campidelli; M.J. Hÿtch; F. Houdellier; A. Claverie; D. Bensahel

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 425 KB
Volume: 12
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2009.07.006

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