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Room-temperature deposition of high-purity silicon oxide films by RF plasma-enhanced CVD

✍ Scribed by Katsuya Teshima; Yasushi Inoue; Hiroyuki Sugimura; Osamu Takai


Book ID
108422969
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
589 KB
Volume
146-147
Category
Article
ISSN
0257-8972

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