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Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD

โœ Scribed by Dong S Kim; Young H Lee

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
923 KB
Volume
283
Category
Article
ISSN
0040-6090

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## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 ยฐC in a vacuum process. It also provides good thickness controllability and uniformity of the depos