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Room-temperature deposition of highly-insulating SiOCH films by plasma-enhanced chemical vapor deposition using tetraethoxysilane

✍ Scribed by Keisuke Yamaoka; Yoshikazu Terai; Yuji Yoshizako; Yasufumi Fujiwara

Book ID: 108290129
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 338 KB
Volume: 517
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2008.06.049

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