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Deposition parameters studies of silicon nitride films prepared by plasma-enhanced CVD process using silane-ammonia

✍ Scribed by K. R. Lee; K. B. Sundaram; D. C. Malocha

Publisher: Springer US
Year: 1993
Tongue: English
Weight: 428 KB
Volume: 4
Category: Article
ISSN: 0957-4522
DOI: 10.1007/bf00179225

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