✦ LIBER ✦

Redistribution of implanted impurities in dual As+ and B+ implanted silicon during annealing

✍ Scribed by Katsuhiro Yokota; Takafumi Nakamura; Takaei Kitagawa; Fumiyoshi Miyashita; Kiyoto Hirai; Hiromichi Takano; Masao Kumagai

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Impurity redistribution in Pb implanted

✍ C.E. Christodoulides 📂 Article 📅 1978 🏛 Elsevier Science 🌐 English ⚖ 315 KB

Redistribution of P atoms in oxidized P-

✍ Katsuhiro Yokota*; Makoto Aoki; Kazuhiro Nakamura; Masayasu Tannjou; Shigeki Sak 📂 Article 📅 2004 🏛 Springer US 🌐 English ⚖ 425 KB

Redistribution of ion-implanted impuriti

✍ Wu, C.P.; Douglas, E.C.; Mueller, C.W. 📂 Article 📅 1976 🏛 IEEE 🌐 English ⚖ 322 KB

SIMS study on redistribution of implante

✍ N.N. Gerasimenko; G.S. Khryashchev; G.L. Kuryshev; A.M. Myasnikov; V.I. Obodniko 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 367 KB

Electrical activation and impurity redis

📂 Article 📅 1982 🏛 Elsevier Science 🌐 English ⚖ 119 KB

Electrical Activation and Impurity Redis

✍ Bhattacharyya, A.; Iyer, V.; Streetman, B.; Baker, J.; Williams, P. 📂 Article 📅 1981 🏛 IEEE 🌐 English ⚖ 525 KB