Electrical activation and impurity redistribution during pulsed laser annealing of BF+2 implanted amorphized silicon

• Book ID: 108362143
• Publisher: Elsevier Science
• Year: 1982
• Tongue: English
• Weight: 119 KB
• Volume: 22
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/s0026-2714(82)80714-2