Electrical Activation and Impurity Redistribution During Pulsed Laser Annealing of BF2+Implanted Amorphized Silicon

✍ Scribed by Bhattacharyya, A.; Iyer, V.; Streetman, B.; Baker, J.; Williams, P.

• Book ID: 117911395
• Publisher: IEEE
• Year: 1981
• Tongue: English
• Weight: 525 KB
• Volume: 4
• Category: Article
• ISSN: 0148-6411
• DOI: 10.1109/tchmt.1981.1135844