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Redistribution of P atoms in oxidized P-implanted silicon during annealing

✍ Scribed by Katsuhiro Yokota*; Makoto Aoki; Kazuhiro Nakamura; Masayasu Tannjou; Shigeki Sakai; Kouhei Sekine; Masanori Watanabe

No coin nor oath required. For personal study only.

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