Freestanding GaN wafers were produced by a newly developed self-separation method. Thick GaN layers were grown using hydride vapor phase epitaxy on a sapphire substrate with GaN seeds. The separation of the thick GaN layers took place during the growth sequence at the interface of GaN/sapphire, beca
Red luminescence from freestanding GaN grown on LiAlO2substrate by hydride vapor phase epitaxy
✍ Scribed by Wang, Lijun ;Richter, E. ;Weyers, M.
- Book ID
- 105363916
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 171 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
Photoluminescence (PL) spectroscopy was used to study the red luminescence band from freestanding GaN grown on LiAlO~2~ substrate by hydride vapor phase epitaxy. The red luminescence band was observed with its peak at 1.78 eV and 1.85 eV at 10 K and 300 K, respectively. Temperature‐dependent PL data show that the 1.78 eV red band is due to a donor‐acceptor pair (DAP) transition. Excitation‐intensity‐dependent PL measurements at 10 K and 300 K reveal that the 1.85 eV band at 300 K is the overlap of the DAP band and the electron‐to‐acceptor (e, A^0^) transition band. Ion‐implantation experiments confirmed that both carbon and oxygen impurities are involved in the red luminescence transition. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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