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Fabrication of Freestanding GaN Wafers by Hydride Vapor-Phase Epitaxy with Void-Assisted Separation

โœ Scribed by Oshima, Y. ;Eri, T. ;Shibata, M. ;Sunakawa, H. ;Usui, A.


Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
114 KB
Volume
194
Category
Article
ISSN
0031-8965

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Self-Separation of Freestanding GaN from
โœ Tomita, K. ;Kachi, T. ;Nagai, S. ;Kojima, A. ;Yamasaki, S. ;Koike, M. ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 153 KB ๐Ÿ‘ 2 views

Freestanding GaN wafers were produced by a newly developed self-separation method. Thick GaN layers were grown using hydride vapor phase epitaxy on a sapphire substrate with GaN seeds. The separation of the thick GaN layers took place during the growth sequence at the interface of GaN/sapphire, beca