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Reasons for lower dielectric constant of fluorinated SiO2 films

✍ Scribed by Han, Sang M.; Aydil, Eray S.

Book ID: 111922566
Publisher: American Institute of Physics
Year: 1998
Tongue: English
Weight: 361 KB
Volume: 83
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.366955

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