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Fluorinated nanoporous SiO2 films with ultra-low dielectric constant

โœ Scribed by C.M. Zhen; J.J. Zhang; Y.J. Zhang; C.X. Liu; C.F. Pan; D.L. Hou

Book ID
116671261
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
485 KB
Volume
354
Category
Article
ISSN
0022-3093

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