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Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry

✍ Scribed by B Johs; C Herzinger; J.H Dinan; A Cornfeld; J.D Benson; D Doctor; G Olson; I Ferguson; M Pelczynski; P Chow; C.H Kuo; S Johnson

No coin nor oath required. For personal study only.

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