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Real-time in situ monitoring of antireflection coatings for semiconductor laser amplifiers by ellipsometry

✍ Scribed by Wu, I.-F.; Riant, I.; Verdiell, J.-M.; Dagenais, M.


Book ID
119783516
Publisher
IEEE
Year
1992
Tongue
English
Weight
311 KB
Volume
4
Category
Article
ISSN
1041-1135

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## Abstract Metal Organic Chemical Vapor Deposition (MOCVD) is nowadays the most frequently used industrial method for growing III‐nitrides. The possible spectrum of in‐situ diagnostic tools is quite narrow because the MOCVD growth process excludes all techniques based on ultra high vacuum conditio