Reactivity of RF magnetron sputtered CaSi2 film
β Scribed by H. Nakano; S. Yamanaka; M. Hattori
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 354 KB
- Volume
- 53-56
- Category
- Article
- ISSN
- 0167-2738
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π SIMILAR VOLUMES
Polycrystalline Zn 3 N 2 films are prepared on Si and quartz glass substrates by RF magnetron sputtering at room temperature. The structural and optical properties are studied by X-ray diffraction and double beam spectrophotometer, respectively. X-ray diffraction indicates that the Zn 3 N 2 films de
The technologies of fabrication of thin film phosphors based on gallium nitride using rf-magnetron sputtering are developed and properties of films are studied. Spectral parameters of rf-discharge plasma emission of nitrogen used as a working gas are investigated. The dependence of GaN thin film dep