𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Reactive-magnetron-sputtered chromium carbide films

✍ Scribed by Vandna Agarwal; V.D. Vankar; K.L. Chopra


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
357 KB
Volume
169
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


DC reactive magnetron sputtered ZnO film
✍ Tomonobu Hata; Toshiharu Minamikawa; Osamu Morimoto; Toshio Hada πŸ“‚ Article πŸ“… 1979 πŸ› Elsevier Science 🌐 English βš– 480 KB
Characterization of reactive DC magnetro
✍ B. Subramanian; K. Ashok; P. Kuppusami; C. Sanjeeviraja; M. Jayachandran πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 180 KB

## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had