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Proximity correction of chemically amplified resists for electron beam lithography

✍ Scribed by Zheng Cui; Philp D Prewett

Book ID: 114155767
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 312 KB
Volume: 41-42
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(98)00041-0

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