𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography

✍ Scribed by Kozawa, Takahiro; Tagawa, Seiichi


Book ID
118223587
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
430 KB
Volume
99
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.