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E-beam proximity correction for negative tone chemically amplified resists taking into account post-bake effects

✍ Scribed by N. Glezos; G.P. Patsis; A. Rosenbusch; Z. Cui


Book ID
114155798
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
273 KB
Volume
41-42
Category
Article
ISSN
0167-9317

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