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Properties of ZnO thin films deposited by DC reactive magnetron sputtering under different plasma power

โœ Scribed by Dongping Zhang; Ping Fan; Xingmin Cai; Jianjun Huang; Lili Ru; Zhuanghao Zheng; Guangxing Liang; Yukun Huang

Publisher
Springer
Year
2009
Tongue
English
Weight
408 KB
Volume
97
Category
Article
ISSN
1432-0630

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โœ Ying Zhou; Donghong Gu; Yongyou Geng; Fuxi Gan ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 330 KB

The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos