Room temperature deposition and properties of ZnO:Al thin films by nonreactive DC magnetron sputtering
β Scribed by Hua Wang; Jiwen Xu; Mingfang Ren; Ling Yang
- Publisher
- Springer US
- Year
- 2007
- Tongue
- English
- Weight
- 451 KB
- Volume
- 19
- Category
- Article
- ISSN
- 0957-4522
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## Abstract Al doped ZnO films were prepared by reactive direct current (DC) magnetron sputtering at room temperature. The targets were metallic Al and Zn while the gases were Ar and O~2~. Xβray diffraction (XRD) shows that the films are of hexagonal structure and Al is successfully doped into ZnO
## Abstract Transparent and conductive Alβdoped ZnO (AZO) films with thickness between 0.2 and 1.1 ΞΌm were deposited by sputtering at room temperature on glass and polyethylene terephthalate (PET) substrates. All films were polycrystalline with average crystallite size increasing when the film thic