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Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures

✍ Scribed by Chun-Lung Chu; Hsin-Chun Lu; Chen-Yang Lo; Chi-You Lai; Yu-Hsiang Wang

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
294 KB
Volume
404
Category
Article
ISSN
0921-4526

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