Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partia
Properties of amorphous carbon nitride prepared by RF reactive sputtering
โ Scribed by Gharbi, R.; Karoui, M. B.; Fathallah, M.; Tresso, E.
- Book ID
- 126998874
- Publisher
- Taylor and Francis Group
- Year
- 2007
- Tongue
- English
- Weight
- 287 KB
- Volume
- 87
- Category
- Article
- ISSN
- 1478-6435
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