✦ LIBER ✦

Mechanical properties of amorphous carbon nitride thin films prepared by reactive magnetron sputter-deposition

✍ Scribed by Dong Li; Yip-Wah Chung; Ming-Show Wong; William D. Sproul

Publisher: Springer US
Year: 1995
Tongue: English
Weight: 379 KB
Volume: 1
Category: Article
ISSN: 1023-8883
DOI: 10.1007/bf00157978

No coin nor oath required. For personal study only.

✦ Synopsis

Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partial pressure. Under optimized deposition conditions, carbon nitride thin films with nanoindentation hardness about 25 GPa have been coated onto Si wafers and M2 steels. A strong correlation between coating hardness and compressive stress in the coating was observed.

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