๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Progress in instrumentation, data reduction, and depth profiles in Auger electron spectroscopy

โœ Scribed by Paul H. Holloway

Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
499 KB
Volume
26
Category
Article
ISSN
0169-4332

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๐Ÿ“œ SIMILAR VOLUMES

Electron-beam effects in depth profiling
Electron-beam effects in depth profiling measurements with Auger electron spectroscopy
๐Ÿ“‚ Article ๐Ÿ“… 1976 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 137 KB

The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.

In-depth composition profile of anodic o
In-depth composition profile of anodic oxide films on aluminium studied by auger electron spectroscopy
โœ S. Matsuzawa; N. Baba; S. Tajima ๐Ÿ“‚ Article ๐Ÿ“… 1979 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 286 KB

In-depth composition profiles of the an&c oxide films grown on Al (1 I1 ), (I 10) and (100) single crystal electrodes in ammonium borate were studied by Auger electron spectroscopy with Ar ion etching. The oxide film had the composition of Ai,O, as referenced to an authentic a-Al,O, single crystal.

American society for testing and materia
American society for testing and materials. Standard guide for depth profiling in auger electron spectroscopy (E1127-91)
๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 444 KB

## Abstract This standard is issued under the fixed designation E1127; the number immediately following the designation indicates the year of original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A superscript epsilo