Electron-beam effects in depth profiling measurements with Auger electron spectroscopy

• Publisher: Elsevier Science
• Year: 1976
• Tongue: English
• Weight: 137 KB
• Volume: 26
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(76)81098-6

✦ Synopsis

The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.