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Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

✍ Scribed by Vlček, J.; Rezek, J.; Houška, J.; Čerstvý, R.; Bugyi, R.

Book ID
121413381
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
811 KB
Volume
236
Category
Article
ISSN
0257-8972

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