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Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides

✍ Scribed by Severin, D.; Kappertz, O.; Kubart, T.; Nyberg, T.; Berg, S.; Pflug, A.; Siemers, M.; Wuttig, M.

Book ID
119993270
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
366 KB
Volume
88
Category
Article
ISSN
0003-6951

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Reactive high power pulsed magnetron sputtering (HPPMS) of zirconium oxide exhibits a stable and hysteresis-free transition zone, as opposed to reactive direct current magnetron sputtering (dcMS). The stabilization of the transition zone in HPPMS facilitates the growth of transparent zirconium oxide