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Structures and properties of a Ta2O5 thin film deposited by dc magnetron reactive sputtering in a pure O2 atmosphere

โœ Scribed by Chen Guoping; Li Lingzhen; Zhang Suixin; Zhang Haokang

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
245 KB
Volume
41
Category
Article
ISSN
0042-207X

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Oxide 5lms in the ZnO+In 2 O 3 and ZnO+tin-doped indium oxide (ITO) systems were deposited by simultaneous dc sputtering of ZnO and In 2 O 3 or ITO facing targets at substrate temperatures from room temperature up to 3003C. The ratio of the ZnO target current to the sum of both the currents was vari