Stress Degradation of Low Field Leakage in Alumina Gate MOS Structures Containing RF Magnetron Sputtered Thin Ta2O5 Films on Silicon

✍ Scribed by Novkovski, N. ;Pecovska-Gjorgjevich, M. ;Atanassova, Elena ;Dimitrova, T.

• Publisher: John Wiley and Sons
• Year: 1999
• Tongue: English
• Weight: 107 KB
• Volume: 172
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/(sici)1521-396x(199904)172:2<r9::aid-pssa99999>3.0.co;2-t