The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

✍ Scribed by Ogwu, A A; Bouquerel, E; Ademosu, O; Moh, S; Crossan, E; Placido, F

• Book ID: 120427665
• Publisher: Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 187 KB
• Volume: 38
• Category: Article
• ISSN: 0022-3727
• DOI: 10.1088/0022-3727/38/2/011