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Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering

✍ Scribed by Prabitha B. Nair; V.B. Justinvictor; Georgi P. Daniel; K. Joy; V. Ramakrishnan; P.V. Thomas

Book ID
116244593
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
712 KB
Volume
257
Category
Article
ISSN
0169-4332

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ZnO thin films were deposited on corning glass substrates by RF magnetron sputtering at room temperature. The dependence of crystal structure, morphology and optical properties on postdeposition annealing was investigated using XRD, AFM and UV-vis Spectrophotometer. The asdeposited films were amorph