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On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping

โœ Scribed by Pandian, Ramanathaswamy; Natarajan, Gomathi; Rajagopalan, S.; Kamruddin, M.; Tyagi, A. K.

Book ID
125345005
Publisher
Springer
Year
2014
Tongue
English
Weight
868 KB
Volume
116
Category
Article
ISSN
1432-0630

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Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substrates
โœ M.C. Lin; L.-S. Chang; H.C. Lin ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 818 KB

Titanium oxynitride (TiN x O y ) films have been deposited onto polyethylene terephthalate (PET) substrates by reactive radio frequency (RF) magnetron sputtering. The influence of the nitrogen (N 2 ) partial pressure in the discharge atmosphere, with a set pressure of 0.133 Pa, was examined. Other d