๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Oxygen Partial Pressure Dependence of the Properties of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

โœ Scribed by M. Horprathum; P. Eiamchai; P. Chindaudom; A. Pokaipisit; P. Limsuwan

Book ID
119356633
Publisher
Elsevier
Year
2012
Tongue
English
Weight
535 KB
Volume
32
Category
Article
ISSN
1877-7058

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effects of oxygen partial pressure on re
Effects of oxygen partial pressure on resistive switching characteristics of ZnO thin films by DC reactive magnetron sputtering
โœ Zhenguo Ji; Qinan Mao; Weiqing Ke ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 929 KB

Cu/ZnO/n + -Si structures were prepared by magnetron sputtering of a layer of ZnO thin film onto heavily doped silicon substrate, followed by thermal evaporation of a thin layer of metallic Cu. The resistive switching characteristics of Cu/ZnO/n + -Si structures were investigated as a function of ox