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Preparation and Thermoelectric Property of Boron Thin Film

✍ Scribed by K. Kamimura; T. Yoshimura; T. Nagaoka; M. Nakao; Y. Onuma; M. Makimura

Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
151 KB
Volume
154
Category
Article
ISSN
0022-4596

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✦ Synopsis

Boron thin 5lms were deposited by electron beam evaporation and by pyrolysis of decaborane on quartz substrates. Re6ection electron beam di4raction was used to characterize the crystal structure. The amorphous structure was observed for the 5lm deposited by electron beam evaporation. The 5lm was polycrystalline -rhombohedral boron when the 5lm was deposited by pyrolysis. All samples showed p-type conduction. The conductance of the 5lm deposited by electron beam evaporation decreased linearly against T ؊4 . Linear relation was observed in the log against T ؊1 plot for the 5lm deposited by pyrolysis. The thermoelectric power of the 5lm deposited by electron beam evaporation decreased from 500 to 300 V/K as the temperature increased from 300 to 800 K. The power factor increased from 10 ؊9 to 10 ؊6 V 2 ؊1 K ؊2 cm ؊1 with increasing temperature from 300 to 800 K.

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