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Preparation and properties of amorphous TiO2 thin films by plasma enhanced chemical vapor deposition

✍ Scribed by Won Gyu Lee; Seong Ihl Woo; Jong Choul Kim; Soo Han Choi; Kye Hwan Oh

Book ID
107864476
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
570 KB
Volume
237
Category
Article
ISSN
0040-6090

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Preparation of hydrogenated amorphous si
Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition
✍ J Huran; J Ε afrΓ‘nkovΓ‘; A.P. Kobzev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 252 KB

Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic