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Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

✍ Scribed by Fabio Iacona; Giulio Ceriola; Francesco La Via

Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 110 KB
Volume: 4
Category: Article
ISSN: 1369-8001
DOI: 10.1016/s1369-8001(00)00130-x

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