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Preparation of SixCyHz films from methylsilane by plasma-enhanced chemical vapor deposition

✍ Scribed by M.P. Delplancke; J.M. Powers; G.J. Vandentop; G.A. Somorjai


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
494 KB
Volume
202
Category
Article
ISSN
0040-6090

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Pulsed plasma-enhanced chemical vapor de
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Films deposited using pulsed plasma-enhanced chemical vapor deposition (PECVD) from hexafluoropropylene oxide (HFPO) were investigated by X-ray photoelectron spectroscopy (XPS). As compared to continuous rf PECVD, pulsed excitation increases the CF 2 fraction in the film. Film composition was determ